Title of article :
Diffusion behavior of sulfur in the p(1×1) phase of a S/Ni(111) system
Author/Authors :
H. Tsukawaki، نويسنده , , S. and Hatano، نويسنده , , Y. and Hashizume، نويسنده , , K. and Sugisaki، نويسنده , , M.، نويسنده ,
Issue Information :
هفته نامه با شماره پیاپی سال 2000
Abstract :
The surface phase diagram of S/Ni(111) in the temperature range from room temperature to 900 K has been established by reflection high-energy electron diffraction observations in consultation with previously reported data. The temperature dependence of surface diffusion coefficient of sulfur in a p(1×1) phase was measured with micro probe Auger electron microscopy from 513 to 597 K. The diffusion coefficient in the p(1×1) phase in the coverage region from 0.05 to 0.10 ML is expressed as: D (cm2 s−1)=2×103 exp[−1.1±0.1(eV)/kBT].
Keywords :
nickel , surface diffusion , surface structure , morphology , Roughness , and topography , Sulphur
Journal title :
Surface Science
Journal title :
Surface Science