Title of article :
Influence of surface degrees of freedom on the adsorption of Ge ad-atoms on Si(1 0 0)
Author/Authors :
Gustavo M. Dalpian، نويسنده , , G.M. and Fazzio، نويسنده , , A. and da Silva، نويسنده , , Antônio J.R.، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2001
Pages :
5
From page :
19
To page :
23
Abstract :
The adsorption of the Ge monomer on the Si(1 0 0) surface is studied through first principles calculations based on the density-functional theory. We have observed that, for a given position of the monomer on the surface, there are many local minima which differ in the substrate local configuration of the buckling of the silicon dimers. We show that this local configuration may also play an important role for the diffusion of these ad-atoms.
Journal title :
Computational Materials Science
Serial Year :
2001
Journal title :
Computational Materials Science
Record number :
1679091
Link To Document :
بازگشت