Title of article
Linear and nonlinear regime of a random resistor network under biased percolation
Author/Authors
Pennetta، نويسنده , , C. and Alfinito، نويسنده , , E. and Reggiani، نويسنده , , L.، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2004
Pages
6
From page
120
To page
125
Abstract
We investigate the steady state of a two-dimensional random resistor network subjected to two competing biased percolations as a function of the bias strength. The properties of the linear and nonlinear regimes are studied by means of Monte Carlo simulations. In constant current conditions, a scaling relation is found between 〈R〉/〈R〉0 and I/I0, where 〈R〉 is the average network resistance, 〈R〉0 the Ohmic resistance and I0 an appropriate threshold value for the onset of nonlinearity. A similar scaling relation is found also for the relative variance of resistance fluctuations. These results are in good agreement with electrical breakdown measurements performed in composite materials.
Journal title
Computational Materials Science
Serial Year
2004
Journal title
Computational Materials Science
Record number
1680408
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