Title of article :
Growth morphology in the Co/Cu(0 0 1) system
Author/Authors :
Fassbender، نويسنده , , J. and Bischof، نويسنده , , A. and Allenspach، نويسنده , , R. and May، نويسنده , , U. and Lange، نويسنده , , M. and Rüdiger، نويسنده , , U. and Güntherodt، نويسنده , , G.، نويسنده ,
Issue Information :
هفته نامه با شماره پیاپی سال 2001
Abstract :
Growth morphology in Co/Cu/Co films deposited on stepped Cu(0 0 1) is investigated by reflection high-energy electron diffraction (RHEED) and magneto-optical Kerr effect. The interlayer Cu film thickness is varied from fractions of a monolayer to several monolayers in order to determine the influence of Cu island nucleation on subsequent Co growth. From the analysis of the oscillations in RHEED intensity and in the uniaxial step anisotropy a growth model is proposed which extends earlier scanning tunneling microscopy observations. The different role of Co atoms at island edges as compared to those at pre-existing steps is elucidated.
Keywords :
Stepped single crystal surfaces , Roughness , Magnetic measurements , surface structure , growth , Copper , Cobalt , morphology , Reflection high-energy electron diffraction (RHEED) , Magnetic films , and topography
Journal title :
Surface Science
Journal title :
Surface Science
