Title of article
Rf-sputtering deposition and magnetic characterisation of Nd–Fe–B thin films for microwave applications
Author/Authors
M. and Valetas، نويسنده , , M. and Vérité، نويسنده , , M. and Bessaudou، نويسنده , , A. and Cosset، نويسنده , , F. and Vareille، نويسنده , , J.C.، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2005
Pages
5
From page
163
To page
167
Abstract
The current trend towards integration in the telecommunication field leads us to study the magnetic layers. Nd–Fe–B films on Mo and Si(1 0 0) substrates, of the form of Mo/Nd–Fe–B, Si(1 0 0)/Nd–Fe–B, Si(1 0 0)/Ti/Nd–Fe–B and Si/Ti/Nd–Fe–B/Ti were prepared by magnetron sputtering. The effect of deposition parameters on the structure and the magnetic properties of the films has been studied. The hard Nd2Fe14B phase is formed by a postannealing treatment under argon only on the Si/Ti/NdFeB/Ti multilayers. The Ti underlayer prevents Fe–Si reactions and the Ti overlayer avoids Nd oxidation. No special crystallographic anisotropy is detected. The coercitive fields are about 480 kA/m. The presence of Nd2Fe14B phase is proved by low temperature magnetic measurements.
Journal title
Computational Materials Science
Serial Year
2005
Journal title
Computational Materials Science
Record number
1680796
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