Title of article :
Toluene adsorption on Si(1 1 1)7×7 studied by synchrotron-radiation photoemission
Author/Authors :
Carbone، نويسنده , , M and Piancastelli، نويسنده , , M.N and Casaletto، نويسنده , , M.P. and Zanoni، نويسنده , , R and Comtet، نويسنده , , G and Dujardin، نويسنده , , G and Hellner، نويسنده , , L، نويسنده ,
Issue Information :
هفته نامه با شماره پیاپی سال 2002
Pages :
7
From page :
186
To page :
192
Abstract :
The toluene adsorption on Si(1 1 1)7×7 was studied by valence band synchrotron-radiation photoemission at room temperature as a function of exposure and time. We found that the adsorption process occurs preferentially on rest atoms and that toluene adsorption is time dependent, since the adsorption features disappear and the rest atoms related feature re-appears as a function of time. The features time evolution is quadratic, hinting at a thermal desorption process. The high desorption rate allows us to rule out a dissociative adsorption involving the methyl group. Our conclusion is that toluene is molecularly π-bonded through the aromatic electrons on silicon rest atoms.
Keywords :
Photon stimulated desorption (PSD) , Synchrotron radiation photoelectron spectroscopy , Single crystal surfaces , Chemisorption , Aromatics
Journal title :
Surface Science
Serial Year :
2002
Journal title :
Surface Science
Record number :
1681030
Link To Document :
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