Title of article :
Formation of Cs–H surface compounds
Author/Authors :
Rogozia، نويسنده , , Marco and Niehus، نويسنده , , Horst and Bِttcher، نويسنده , , Artur، نويسنده ,
Issue Information :
هفته نامه با شماره پیاپی سال 2002
Abstract :
The role of the Ru surface in the formation of Cs–H compounds has been investigated by using thermal desorption spectroscopy (TDS), ultraviolet photoelectron spectroscopy, UPS(21.2 eV) and metastable de-excitation spectroscopy (MDS). Cs atoms pre-adsorbed on Ru(0 0 0 1) surface considerably reduce the effective sticking probability for dissociative adsorption of hydrogen but a saturated Cs adlayer does not stop the hydrogen accommodation. Within the initial hydrogenation stage the system exhibits metallic properties. It represents H−α anions and Cs+ν ions coexisting without creating lateral strong ionic bonds. TDS and MDS indicate that the coadsorbed species exhibit a metal–insulator transition only for a hydrogen exposure in the range of 480–1200 L. The insulating phase is marked out by an additional H−β ionic hydrogen species which is responsible for the entire depletion of the Cs 6s state. A weak H2 desorption peak at 1090 K reveals the formation and decomposition of Cs hydrides at surface defects.
Keywords :
hydrogen atom , Chemisorption , Ruthenium , Hydrides , Surface defects , Thermal desorption spectroscopy
Journal title :
Surface Science
Journal title :
Surface Science