Multilayer characterization by energy dispersive X-ray reflectivity technique

An experimental setup was developed to verify the feasibility of silicon drift detector to be used for the multilayer characterization by means of multilayer energy dispersive X-ray reflectivity. Such a detector allows high count rates up to 3 × 105 cps and can be used in principle for the direct beam intensity measurement, which is to be done for the X-ray multilayer reflectivity patterns obtaining. A series of measurements were performed for Mo/B4C multilayer sample. A quality of the experimentally obtained data turns out to be enough to perform a sample structure exploration using a numerical procedure of experimental data fitting. Due to low cost and short time, required for the measurements, an experimental technique proposed has a good perspective to be used for some practical applications in industry.