Title of article :
Large scale high precision nano-oxidation using an atomic force microscope
Author/Authors :
Kuramochi، نويسنده , , H. and Ando، نويسنده , , K. and Tokizaki، نويسنده , , T. and Yasutake، نويسنده , , M. and Pérez-Murano، نويسنده , , F. and Dagata، نويسنده , , J.A. and Yokoyama، نويسنده , , H.، نويسنده ,
Issue Information :
هفته نامه با شماره پیاپی سال 2004
Pages :
6
From page :
343
To page :
348
Abstract :
Scanning probe microscope nano-oxidation is carried out on H-passivated Si(0 0 1) surfaces using a humidity control atomic force microscope (AFM) in contact and dynamic modes. To achieve high precision nano-oxidation at large scale, the original tube-scanner-based AFM unit is modified: horizontal movement of the whole sample block (sample stage and the scanner) is operated by an additional XY piezo stage, whilst its vertical movement is controlled by a piezo tube-scanner. The high linearity of the horizontal movement is demonstrated by high resolution oxide patterns which are fabricated after the instrumental modification using standard AFM cantilevers and a modified AFM cantilever with an added carbon nano-tube on tip.
Keywords :
Oxidation , atomic force microscopy , Silicon
Journal title :
Surface Science
Serial Year :
2004
Journal title :
Surface Science
Record number :
1682003
Link To Document :
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