Author/Authors :
Kuramochi، نويسنده , , H. and Tokizaki، نويسنده , , T. and Onuki، نويسنده , , T. and Okabayashi، نويسنده , , J. and Mizuguchi، نويسنده , , M. and Takano، نويسنده , , F. and Oshima، نويسنده , , H. and Manago، نويسنده , , T. and Akinaga، نويسنده , , H. and Yokoyama، نويسنده , , H.، نويسنده ,
Abstract :
Nanometer-scale structures were fabricated by anodic oxidation using scanning probe microscopes on thin-films of various 3d-metal compounds and alloys on GaAs, such as MnAs, MnSb, Cr2O3, CoCr and NiFe. Material variation advances the developments in nano-fabrication by scanning probe microscope. Comparing the oxidation conditions, new methodology for fabrication of nano-devices is explored.
Keywords :
Metal–semiconductor magnetic thin film structures , Oxidation , Manganese , Chromium , atomic force microscopy , Magnetic films
