Title of article :
Surface oxidation of liquid Sn
Author/Authors :
Grigoriev، نويسنده , , Alexei and Shpyrko، نويسنده , , Oleg and Steimer، نويسنده , , Christoph and Pershan، نويسنده , , Peter S. and Ocko، نويسنده , , Benjamin M. and Deutsch، نويسنده , , Moshe and Lin، نويسنده , , Binhua and Meron، نويسنده , , Mati and Graber، نويسنده , , Timothy and Gebhardt، نويسنده , , Jeffrey، نويسنده ,
Issue Information :
هفته نامه با شماره پیاپی سال 2005
Pages :
10
From page :
223
To page :
232
Abstract :
We report the results of an X-ray scattering study that reveals oxidation kinetics and formation of a previously unreported crystalline phase of SnO at the liquid–vapour interface of Sn. Our experiments reveal that the pure liquid Sn surface does not react with molecular oxygen below an activation pressure of ∼5.0 × 10−6 Torr. Above that pressure a rough solid Sn oxide grows over the liquid metal surface. Once the activation pressure has been exceeded the oxidation proceeds at pressures below the oxidation pressure threshold. The observed diffraction pattern associated with the surface oxidation does not match any of the known Sn oxide phases. The data have an explicit signature of the face-centred cubic structure, however it requires lattice parameters that are about 9% smaller than those reported for cubic structures of high-pressure phases of Sn oxides.
Keywords :
X-Ray scattering , and reflection , Diffraction , Oxidation , Surface chemical reaction , surface structure , Roughness , morphology , Tin oxides , and topography , Polycrystalline thin films , TIN , liquid surfaces
Journal title :
Surface Science
Serial Year :
2005
Journal title :
Surface Science
Record number :
1682592
Link To Document :
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