Title of article :
Mechanisms of preferential adsorption on the Si(1 1 1)7 × 7 surface
Author/Authors :
Vasco، نويسنده , , E.، نويسنده ,
Issue Information :
هفته نامه با شماره پیاپی سال 2005
Pages :
13
From page :
247
To page :
259
Abstract :
The surface relaxation mechanisms governing the preferential adsorption of metal atoms onto the faulted half-cells of a 7 × 7 reconstructed Si(1 1 1) surface are studied by rate equations and kinetic Monte Carlo simulations. The versatility of these mechanisms to control the formation of quasi-perfect 2D arrays of metal clusters is revealed via the optimization of the deposition/annealing conditions as a function of operating mechanisms, the Si(1 1 1)7 × 7 energy landscape, and the thermal stability of the created clusters. The influence on the formation process of such nanoarrays of the balance between kinetic limitations, which are especially relevant on Si(1 1 1)7 × 7, and thermodynamic tendencies is discussed.
Keywords :
Si(1  , 7 , 1)7  , surface diffusion , Monte Carlo simulations , ×  , Metal clusters , SELF-ASSEMBLY , 1  , Adsorption kinetics , Metal–semiconductor interface , Surface relaxation and reconstruction
Journal title :
Surface Science
Serial Year :
2005
Journal title :
Surface Science
Record number :
1682597
Link To Document :
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