• Title of article

    Wavelet analysis of the surface morphologic of nanocrystalline TiO2 thin films

  • Author/Authors

    Lin، نويسنده , , Yuan and Xiao، نويسنده , , Xu Rui and Li، نويسنده , , Xue Ping and Zhou، نويسنده , , Xiao Wen، نويسنده ,

  • Issue Information
    هفته نامه با شماره پیاپی سال 2005
  • Pages
    10
  • From page
    37
  • To page
    46
  • Abstract
    Surface morphologies of nanocrystalline TiO2 thin films were studied by analyzing the surface profile of AFM images using wavelet transform method. Based on characterizing the fractal feature and computing the image details at different orientations and resolutions, the surface textures of nanocrystalline TiO2 thin films before and after chemical treatment were examined. The results reveal that titanium isopropoxide treatment leads to an increase of surface roughness. The related mechanism of modification of the microstructure by chemical treatment associated with the improvement of the photocurrent response is discussed.
  • Keywords
    atomic force microscopy , surface structure , morphology , roughness and topography , Titanium oxide , Semiconducting surfaces , Surface chemical reaction , Fractal surface
  • Journal title
    Surface Science
  • Serial Year
    2005
  • Journal title
    Surface Science
  • Record number

    1682671