Title of article :
Wavelet analysis of the surface morphologic of nanocrystalline TiO2 thin films
Author/Authors :
Lin، نويسنده , , Yuan and Xiao، نويسنده , , Xu Rui and Li، نويسنده , , Xue Ping and Zhou، نويسنده , , Xiao Wen، نويسنده ,
Issue Information :
هفته نامه با شماره پیاپی سال 2005
Pages :
10
From page :
37
To page :
46
Abstract :
Surface morphologies of nanocrystalline TiO2 thin films were studied by analyzing the surface profile of AFM images using wavelet transform method. Based on characterizing the fractal feature and computing the image details at different orientations and resolutions, the surface textures of nanocrystalline TiO2 thin films before and after chemical treatment were examined. The results reveal that titanium isopropoxide treatment leads to an increase of surface roughness. The related mechanism of modification of the microstructure by chemical treatment associated with the improvement of the photocurrent response is discussed.
Keywords :
atomic force microscopy , surface structure , morphology , roughness and topography , Titanium oxide , Semiconducting surfaces , Surface chemical reaction , Fractal surface
Journal title :
Surface Science
Serial Year :
2005
Journal title :
Surface Science
Record number :
1682671
Link To Document :
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