Production of the ideal sample shape for Total Reflection X-ray Fluorescence analysis

Total Reflection X-ray Fluorescence analysis (TXRF) is a well-established analytical method in the semiconductor industry for the analysis of silicon wafer surfaces. For the calibration of the spectrometer typically an external standard is used which is sensitive to quantification errors. In general TXRF is known to allow for linear calibration. For small sample amounts (pg to ng region) the thin film approximation is valid neglecting absorption effects of the exciting and the detected radiation. For higher total amounts of sample the relation between fluorescence intensity and sample amount diverges from linearity (saturation effect). These deviations lead to difficulties in quantification with external standard. Content of the presented work is the production of the ideal TXRF sample shape, which was theoretically determined to be ring shaped. A possibility for the production of samples with ring shape is the use of a nanodispensing system combined with a positioning device. Therewith it is possible to produce ring shaped samples in a controlled way with the ring consisting of individual nanodroplets, so that the wanted diameter of the ring can be chosen. A comparison of the fluorescence intensities emitted by contracted and ring shaped samples shows that the ring shape is not only theoretically the best TXRF shape but also experimentally. It could be proven that for contracted samples the saturation effect occurs at a lower sample mass than for samples with ring shape.