• Title of article

    Diffusion kinetics of Bi and Pb–Bi monolayer precursing films on Cu(1 1 1)

  • Author/Authors

    Moon، نويسنده , , Jaehyun and Wynblatt، نويسنده , , Paul and Garoff، نويسنده , , Stephen and Suter، نويسنده , , Robert، نويسنده ,

  • Issue Information
    هفته نامه با شماره پیاپی سال 2004
  • Pages
    9
  • From page
    149
  • To page
    157
  • Abstract
    We have used Auger electron spectroscopy to study the diffusive spreading and adsorption of pure Bi and Pb–11 at.%Bi precursing films on Cu(1 1 1) surfaces, from droplets of the respective materials. The Bi diffusion coefficient (DBi) increases with Bi-coverage. However, in the intermediate coverage range, DBi remains approximately constant, which is presumably due to the formation of an ordered Bi hexagonal overlayer. In the case of Pb–Bi alloy spreading, the presence of Bi slows down the Pb diffusion kinetics significantly. The kinetics of Bi spreading are also slower in the presence of Pb, but the effect is less marked. The equilibrium concentrations both at the Pb–Bi drop surface, and in the surrounding precursing film, were found to be Bi-enriched.
  • Keywords
    surface diffusion , Alloys , Bismuth , Bismuth , Copper , Adsorption kinetics , Lead , Auger electron spectroscopy
  • Journal title
    Surface Science
  • Serial Year
    2004
  • Journal title
    Surface Science
  • Record number

    1684703