• Title of article

    Effect of the chemical vapor deposition environment on the faceted surface of α-(0 0 0 1) sapphire

  • Author/Authors

    Saw، نويسنده , , K.G. and Plessis، نويسنده , , J. du، نويسنده ,

  • Issue Information
    هفته نامه با شماره پیاپی سال 2004
  • Pages
    8
  • From page
    251
  • To page
    258
  • Abstract
    The terrace-and-step structure on the α-(0 0 0 1) sapphire surface induced by annealing has been known to be stable unlike the 7 × 7 reconstructed surface of silicon. However, the behavior of the terrace-and-step structure in an actual growth environment is relatively unknown. This article investigates the effect of the H2–CH4 chemical vapor deposition environment on the faceted surface of α-(0 0 0 1) sapphire using atomic force microscopy, Auger electron spectroscopy, X-ray photoelectron spectroscopy and Raman spectroscopy.
  • Keywords
    Growth , surface structure , Aluminum oxide , and topography , Roughness , morphology , Atomic force microscopyAuger electron spectroscopy , chemical vapor deposition , Etching , diamond
  • Journal title
    Surface Science
  • Serial Year
    2004
  • Journal title
    Surface Science
  • Record number

    1684856