Title of article :
Diffusion and stability of small vacancy clusters on Cu(1 0 0)––a simulation study
Author/Authors :
Basham، نويسنده , , M. and Mulheran، نويسنده , , P.A. and Montalenti، نويسنده , , F.، نويسنده ,
Issue Information :
هفته نامه با شماره پیاپی سال 2004
Abstract :
The stability and mobility of small vacancy clusters on the Cu(1 0 0) surface has been investigated using temperature-accelerated dynamics simulation. The rate-limiting step for cluster dissociation is found to involve two-atom shearing, a mechanism previously discovered in the diffusion of small adatom islands. The tetramer vacancy cluster is found to be very stable and to have low diffusivity, suggesting that it may have an important role in the morphological evolution of growing surfaces. The filling of the tetramer vacancy cluster by single adatoms is also investigated, and the similarities to adatom accommodation at downward step-edges are highlighted.
Keywords :
Copper , computer simulations , Clusters
Journal title :
Surface Science
Journal title :
Surface Science