Underpotential deposition of Cd on Ag(1 1 1): an in situ STM study

The kinetics and mechanism of Cd underpotential deposition (UPD) and involved surface alloy formation processes in the system Ag(1 1 1)/Cd2+, SO 4 2 - , are studied by means of combined electrochemical measurements and in situ scanning tunneling microscopy (STM). The results show that the UPD process starts with a formation of an expanded (diluted) adlayer with a superlattice structure Ag(1 1 1)- ( 3 × 19 ) R 23.4 ° . In the underpotential range 50 mV < ΔE < 80 mV this adlayer transforms to a condensed close packed Cd monolayer via a first order phase transition. At long polarization times the condensed monolayer undergoes structural changes involving place exchange processes between Cd atoms and surface Ag atoms. A formation of a second Cd monolayer and a significant Ag–Cd surface alloying take place at lower underpotentials (ΔE < 50 mV). The kinetics of surface alloying are analyzed on the basis of a recently proposed diffusion model including a relatively fast initial formation of a very thin surface alloy film and a subsequent slow alloy growth controlled by solid state diffusion. The anodic dealloying results in an appearance of monatomically deep pits, which disappear quickly at relatively high underpotentials (ΔE > 550 mV) indicating a high mobility of surface Ag atoms.