Title of article :
Self-affine roughness influence on redox reaction charge admittance
Author/Authors :
G. Palasantzas، نويسنده , , George، نويسنده ,
Issue Information :
هفته نامه با شماره پیاپی سال 2005
Pages :
8
From page :
151
To page :
158
Abstract :
In this work we investigate the influence of self-affine electrode roughness on the admittance of redox reactions during facile charge transfer kinetics. The self-affine roughness is characterized by the rms roughness amplitude w, the correlation length ξ, and the roughness exponent H (0 < H < 1). Our calculations allow analytic expressions to be derived for the admittance as a function of the characteristic self-affine roughness parameters. Furthermore, it is shown that the magnitude of the reaction admittance is strongly influenced by the local roughness exponent H or the fine roughness details at short roughness wavelengths, while the influence of the lateral correlation length ξ or the long wavelength roughness ratio w/ξ is of secondary importance. In addition, the dynamic roughness evolution can strongly influence the reaction admittance and it should taken carefully into consideration.
Keywords :
Surface electrical transport , Oxidation , Surface roughness , Metal–electrolyte interfaces
Journal title :
Surface Science
Serial Year :
2005
Journal title :
Surface Science
Record number :
1685152
Link To Document :
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