Title of article
Preparation and characterization of TiO2 thin films using vacuum ultraviolet light in a sol–gel process
Author/Authors
Katsumata، نويسنده , , Ken-ichi and Nakajima، نويسنده , , Akira and Yoshida، نويسنده , , Naoya and Watanabe، نويسنده , , Toshiya and Kameshima، نويسنده , , Yoshikazu and Okada، نويسنده , , Kiyoshi، نويسنده ,
Issue Information
هفته نامه با شماره پیاپی سال 2005
Pages
9
From page
197
To page
205
Abstract
In the current work, we prepared TiO2 thin films using vacuum ultraviolet (VUV) irradiation of several different intensities before firing. We then investigated effects of VUV intensity and alkoxide mixtures on the microstructural evolution of the films. The microstructure of the film without VUV treatment comprises uniform anatase grains. Grains in films with VUV irradiation gradually form a domain-like microstructure with increasing VUV intensity. The heterogeneous hydrolysis rate in the mixed alkoxide will trigger formation of the domain-like microstructure.
Keywords
Titanium dioxide , Thin film , Photoinduced hydrophilicity , Sol–gel
Journal title
Surface Science
Serial Year
2005
Journal title
Surface Science
Record number
1685468
Link To Document