Title of article :
Self-assembly of an aromatic thiolate on Cu(1 0 0): The local adsorption site
Author/Authors :
Allegretti، نويسنده , , Jack F. and Woodruff، نويسنده , , D.P. and Dhanak، نويسنده , , V.R. and Mariani، نويسنده , , C. and Bussolotti، نويسنده , , F. and D’Addato، نويسنده , , S.، نويسنده ,
Issue Information :
هفته نامه با شماره پیاپی سال 2005
Abstract :
The long-range ordered p(2 × 2) self-assembled monolayer formed by dosing 2-mercaptobenzoxazole (MBO, C7H5NOS) on the Cu(1 0 0) surface at room temperature has been structurally characterised by means of normal incidence X-ray standing wavefield absorption (NIXSW) at both (2 0 0) and (1 1 1) reflections. The results show that the S atom, through which the adsorbed molecular thiolate species bonds to the surface, has an interlayer spacing of 1.33 ± 0.05 إ relative to the extended bulk scatterer planes (2 0 0) parallel to the surface and occupies the four-fold coordinated hollow site, with no evidence of major reconstruction. These results are entirely consistent with previous findings for a number of thiolates formed on (1 0 0) noble metal surfaces. The role of the head-group to surface potential corrugation and intermolecular interactions in determining the adsorption site and ordering of this aromatic molecular adsorbate is discussed.
Keywords :
Chemisorption , SELF-ASSEMBLY , Low index single crystal surfaces , Copper , Aromatics , Thiolates , X-ray standing waves , Thin film structures
Journal title :
Surface Science
Journal title :
Surface Science