Title of article :
Magnetism in boron nitride monolayer: Adatom and vacancy defect
Author/Authors :
Yang، نويسنده , , JeongHwa and Kim، نويسنده , , Dongyoo and Hong، نويسنده , , Jisang and Qian، نويسنده , , Xianghong، نويسنده ,
Issue Information :
هفته نامه با شماره پیاپی سال 2010
Pages :
5
From page :
1603
To page :
1607
Abstract :
Using the full potential linearized augmented plane wave (FLAPW) method, we have investigated the adatom or vacancy defect induced magnetic properties of hexagonal boron nitride (h-BN) monolayer. It has been observed that the N vacancy defect has no influence on the magnetic property of h-BN, whereas the B vacancy defect caused spin polarization in the nearest three N atoms. The total magnetic moment is about 0.87 μB within muffin-tin radius (0.29 μB per N atom) and the spin polarized N atoms show metallic feature. In the presence of B adatom defect, we have obtained rather weak spin polarization about 0.1 μB. However, the sizable magnetic moment of 0.38 μB appears in N adatom defect. Both B and N adatom defect systems preserve very close to semiconducting feature with a finite band gap. We have found that the DOS and the XMCD spectral shapes are strongly dependent on the defect type existing in the h-BN monolayer and this finding may help reveal the origin of magnetism in the h-BN layer if one performs surface sensitive experiment such as spin polarized scanning tunneling microscopy or XMCD measurement in the near future.
Keywords :
Defect induced magnetism , hexagonal boron nitride , FLAPW
Journal title :
Surface Science
Serial Year :
2010
Journal title :
Surface Science
Record number :
1685837
Link To Document :
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