Title of article
Magnetism in boron nitride monolayer: Adatom and vacancy defect
Author/Authors
Yang، نويسنده , , JeongHwa and Kim، نويسنده , , Dongyoo and Hong، نويسنده , , Jisang and Qian، نويسنده , , Xianghong، نويسنده ,
Issue Information
هفته نامه با شماره پیاپی سال 2010
Pages
5
From page
1603
To page
1607
Abstract
Using the full potential linearized augmented plane wave (FLAPW) method, we have investigated the adatom or vacancy defect induced magnetic properties of hexagonal boron nitride (h-BN) monolayer. It has been observed that the N vacancy defect has no influence on the magnetic property of h-BN, whereas the B vacancy defect caused spin polarization in the nearest three N atoms. The total magnetic moment is about 0.87 μB within muffin-tin radius (0.29 μB per N atom) and the spin polarized N atoms show metallic feature. In the presence of B adatom defect, we have obtained rather weak spin polarization about 0.1 μB. However, the sizable magnetic moment of 0.38 μB appears in N adatom defect. Both B and N adatom defect systems preserve very close to semiconducting feature with a finite band gap. We have found that the DOS and the XMCD spectral shapes are strongly dependent on the defect type existing in the h-BN monolayer and this finding may help reveal the origin of magnetism in the h-BN layer if one performs surface sensitive experiment such as spin polarized scanning tunneling microscopy or XMCD measurement in the near future.
Keywords
Defect induced magnetism , hexagonal boron nitride , FLAPW
Journal title
Surface Science
Serial Year
2010
Journal title
Surface Science
Record number
1685837
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