Title of article
The local adsorption of pyridine on Si(100) a combined PES and XPD study
Author/Authors
Weier، نويسنده , , D. and Lühr، نويسنده , , T. and Beimborn، نويسنده , , A. and Schِnbohm، نويسنده , , F. and Dِring، نويسنده , , S. and Berges، نويسنده , , U. and Westphal، نويسنده , , C.، نويسنده ,
Issue Information
هفته نامه با شماره پیاپی سال 2011
Pages
7
From page
1784
To page
1790
Abstract
The chemical and geometrical properties of the system pyridine on Si(100) are investigated in a combined photoelectron spectroscopy (XPS) and photoelectron diffraction (XPD) study. Synchrotron radiation was applied to achieve high spectral resolution and a high surface sensitivity. Our studies were performed at saturation coverage of pyridine on silicon. The XPS and XPD results, including diffraction patterns for all spectral resolved components, clearly show that pyridine is reacting with silicon dimer atoms of the (2 × 1)-reconstructed surface. We propose a tetra-σ-bonded structure model and provide detailed structure parameters.
Keywords
pyridine , Organic–semiconductor interface , Photoelectron spectroscopy , Photoelectron diffraction , Silicon
Journal title
Surface Science
Serial Year
2011
Journal title
Surface Science
Record number
1686185
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