Manganese doping influence on the plasmon energy of nickel films

Manganese doping in nickel films capped with copper have been prepared by evaporation in vacuum. The films are composed of grains with an average diameter of ~ 20 nm from scanning electron microscope scans. Optical absorption is measured over a wavelength range of 190–450 nm. Two plasmon peaks are observed at 3.30 eV and 4.45 eV for a range of concentrations of films. The 4.45 eV peak is a bulk plasmon peak that is enhanced by increasing the manganese in nickel. The 3.30 eV peak is a surface plasmon peak that increases in width or strength of plasmon resonance with increasing concentration of manganese. This may be a combination effect of charge carrier concentration and dielectric screening from the reformed electronic band structure caused by manganese doping. By adding manganese into nickel, the ferromagnetic order is further destroyed as a transition into a spin glass occurs. This spin glass behavior is seen in a coercivity measurement at 4 K where the coercivity drops precipitously as the doping concentration increases.