Author/Authors :
Ohno، نويسنده , , Shin-ya and Inoue، نويسنده , , Kei and Morimoto، نويسنده , , Masahiro and Arae، نويسنده , , Sadanori and Toyoshima، نويسنده , , Hiroaki and Yoshigoe، نويسنده , , Akitaka and Teraoka، نويسنده , , Yuden and Ogata، نويسنده , , Shoichi and Yasuda، نويسنده , , Tetsuji and Tanaka، نويسنده , , Masatoshi، نويسنده ,
Abstract :
The initial oxidation on high-index silicon surfaces with (113) and (120) orientations at 820 K has been investigated by real-time X-ray photoemission spectroscopy (Si 2p and O 1s) using 687 eV photons. The time evolutions of the Sin+ (n = 1–4) components in the Si 2p spectrum indicate that the Si2 + state is suppressed on high-index surfaces compared with Si(001). The O 1s state consists of two components, a low-binding-energy component (LBC) and a high-binding-energy component (HBC). It is suggested that the O atom in strained SiOSi contributes to the LBC component. The reaction rates are slower on high-index surfaces compared with that on Si(001).
Keywords :
Oxidation , XPS , Real-time monitoring , Synchrotron radiation , Si surface
