Title of article :
Structure and energetics of segregated and non-segregated H:Ge(001)/Si and Cl:Ge(001)/Si
Author/Authors :
اakmak، نويسنده , , M. and Gay، نويسنده , , S.C.A. and Srivastava، نويسنده , , G.P.، نويسنده ,
Issue Information :
هفته نامه با شماره پیاپی سال 2000
Abstract :
The equilibrium atomic geometry, energetic stability and chemical bonding for H and Cl passivation of the Si/Ge(001)-(2×1) surface have been studied by applying the ab initio pseudopotential method. In a recent theoretical work, a segregated structure in which Si occupies the second layer while Ge floats to the surface was found to be energetically favourable by 0.38 eV per dimer compared with the non-segregated Si-capped structure. Upon hydrogen passivation, the situation is reversed: the non-segregated structure becomes energetically favourable by 0.08 eV per dimer compared with the segregated structure. For chlorine passivation, this energy difference is 0.3 eV per dimer. For the non-segregated H(Cl):Ge(001)/Si system, the Si dimer becomes symmetric with the bond length elongated from 2.26 إ to 2.39 إ (2.42 إ). For the segregated H(Cl):Ge(001)/Si system, the Ge dimer also becomes symmetric with the bond length elongated from 2.39 إ to 2.45 إ (2.46 إ).
Keywords :
Surface potential , etc.) , Surface states , Adsorption kinetics , Silicon , Density functional calculations , Surface electronic phenomena (work function
Journal title :
Surface Science
Journal title :
Surface Science