Title of article
Molecular dynamics simulation of the thermophysical properties of an undercooled liquid Ni50Al50 alloy
Author/Authors
Levchenko، نويسنده , , Elena V. and Evteev، نويسنده , , Alexander V. and Beck، نويسنده , , Daniel R. and Belova، نويسنده , , Irina V. and Murch، نويسنده , , Graeme E.، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2010
Pages
9
From page
465
To page
473
Abstract
The material properties of surface segregation, density (atomic volume), surface energy and self-diffusion in an undercooled liquid Ni50Al50 film model are studied in temperature range of 1550–950 K by molecular dynamics simulations with the well-known embedded-atom method potential developed by Mishin et al. [Y. Mishin, M.J. Mehl, D.A. Papaconstantopoulos, Phys. Rev. B 65 (2002) 224114] for the B2 ordered NiAl compound. The results are then compared with recent molecular dynamics simulation results on the properties of the liquid Ni50Al50 film model in the temperature range 1550–2000 K (higher than the melting temperature of the model).
Keywords
Ni–Al system , atomistic simulation , Molecular dynamics , embedded-atom method , Undercooled liquid alloy
Journal title
Computational Materials Science
Serial Year
2010
Journal title
Computational Materials Science
Record number
1688183
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