Title of article
The Y–Si(111) interface formation studied by scanning tunneling microscopy
Author/Authors
Polop، نويسنده , , J.L Sacedon، نويسنده , , J.L and Mart??n-Gago، نويسنده , , J.A، نويسنده ,
Issue Information
هفته نامه با شماره پیاپی سال 2000
Pages
5
From page
842
To page
846
Abstract
We have investigated the formation of the Y–Si(111) interface at room temperature by the scanning tunneling microscopy (STM) technique. The nucleation of the yttrium is localized to the inner part of every subunit cell of the (7×7) reconstruction. Thus, small silicide-like amorphous islands are formed by reaction of the yttrium atoms with the adatoms and dangling bonds of the rest atoms. By analyzing the voltage dependence of the STM images we have concluded that these nuclei present a semiconducting behavior. For coverages around one monolayer the nuclei coalesce, conferring a metallic character to the interface.
Keywords
Growth , Silicon , surface structure , Metal–semiconductor interfaces , Scanning tunneling microscopy , and topography , morphology , Yttrium , Roughness , Crystalline–amorphous interfaces
Journal title
Surface Science
Serial Year
2000
Journal title
Surface Science
Record number
1688445
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