• Title of article

    STM study of nucleation of Ag on Si(111)-(7×7) at submonolayer coverage

  • Author/Authors

    Sobot??k، نويسنده , , Pavel and O?tʹ?dal، نويسنده , , Ivan and Myslive?ek، نويسنده , , Josef and Jarol?mek، نويسنده , , Tom??، نويسنده ,

  • Issue Information
    هفته نامه با شماره پیاپی سال 2000
  • Pages
    4
  • From page
    847
  • To page
    850
  • Abstract
    The initial stages of nucleation of Ag on Si(111)-(7×7) surface – half unit cell (HUC) filling – were studied in situ by UHV STM. The dependence of the density of Ag-occupied HUCs and of the preference in occupying HUCs on substrate temperature, deposition rate and amount of Ag deposited were measured. The density of filled HUCs was found to be independent of the deposition rate at room temperature. The density is independent of temperature up to 380 K (for a deposition rate of 0.0075 ML s−1) when thermally activated diffusion of Ag adatoms between single HUCs starts to influence growth. At lower temperatures, thermally activated hopping between HUCs is negligible. However, short-range correlations found in the structure of occupied HUCs together with the low density of occupied HUCs at coverage 0.1 ML at room temperature show that non-activated adatom capture by adjacent occupied HUCs plays an important role.
  • Keywords
    GROWTH , surface diffusion , surface structure , morphology , Roughness , and topography , Silicon , epitaxy , silver
  • Journal title
    Surface Science
  • Serial Year
    2000
  • Journal title
    Surface Science
  • Record number

    1688453