Title of article :
STM study of nucleation of Ag on Si(111)-(7×7) at submonolayer coverage
Author/Authors :
Sobot??k، نويسنده , , Pavel and O?tʹ?dal، نويسنده , , Ivan and Myslive?ek، نويسنده , , Josef and Jarol?mek، نويسنده , , Tom??، نويسنده ,
Issue Information :
هفته نامه با شماره پیاپی سال 2000
Pages :
4
From page :
847
To page :
850
Abstract :
The initial stages of nucleation of Ag on Si(111)-(7×7) surface – half unit cell (HUC) filling – were studied in situ by UHV STM. The dependence of the density of Ag-occupied HUCs and of the preference in occupying HUCs on substrate temperature, deposition rate and amount of Ag deposited were measured. The density of filled HUCs was found to be independent of the deposition rate at room temperature. The density is independent of temperature up to 380 K (for a deposition rate of 0.0075 ML s−1) when thermally activated diffusion of Ag adatoms between single HUCs starts to influence growth. At lower temperatures, thermally activated hopping between HUCs is negligible. However, short-range correlations found in the structure of occupied HUCs together with the low density of occupied HUCs at coverage 0.1 ML at room temperature show that non-activated adatom capture by adjacent occupied HUCs plays an important role.
Keywords :
GROWTH , surface diffusion , surface structure , morphology , Roughness , and topography , Silicon , epitaxy , silver
Journal title :
Surface Science
Serial Year :
2000
Journal title :
Surface Science
Record number :
1688453
Link To Document :
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