• Title of article

    The spatial distribution of non-linear effects in multi-photon photoemission from metallic adsorbates on Si(1 1 1)

  • Author/Authors

    Schmidt، نويسنده , , O and Fecher، نويسنده , , G.H and Hwu، نويسنده , , Y and Schِnhense، نويسنده , , G، نويسنده ,

  • Issue Information
    هفته نامه با شماره پیاپی سال 2001
  • Pages
    6
  • From page
    687
  • To page
    692
  • Abstract
    Multi-photon excitations from thin metallic films on silicon substrates have been observed utilising photoemission electron microscopy. The photoelectrons have been excited by means of high power femtosecond laser pulses with a photon energy below the work function threshold. The strong spatial variations of the non-linear effects became directly visible in electron emission from the adsorbed thin films. Centres of enhanced photoelectron yield, so-called hot spots, were observed on the surfaces of various samples. The multi-photon electron yield of the metallic films (permalloy and lead) depends strongly on the sample topography and the photon polarisation.
  • Keywords
    Electron microscopy , Photoelectron emission , Lead , Alloys , Silicon
  • Journal title
    Surface Science
  • Serial Year
    2001
  • Journal title
    Surface Science
  • Record number

    1690123