Title of article
The spatial distribution of non-linear effects in multi-photon photoemission from metallic adsorbates on Si(1 1 1)
Author/Authors
Schmidt، نويسنده , , O and Fecher، نويسنده , , G.H and Hwu، نويسنده , , Y and Schِnhense، نويسنده , , G، نويسنده ,
Issue Information
هفته نامه با شماره پیاپی سال 2001
Pages
6
From page
687
To page
692
Abstract
Multi-photon excitations from thin metallic films on silicon substrates have been observed utilising photoemission electron microscopy. The photoelectrons have been excited by means of high power femtosecond laser pulses with a photon energy below the work function threshold. The strong spatial variations of the non-linear effects became directly visible in electron emission from the adsorbed thin films. Centres of enhanced photoelectron yield, so-called hot spots, were observed on the surfaces of various samples. The multi-photon electron yield of the metallic films (permalloy and lead) depends strongly on the sample topography and the photon polarisation.
Keywords
Electron microscopy , Photoelectron emission , Lead , Alloys , Silicon
Journal title
Surface Science
Serial Year
2001
Journal title
Surface Science
Record number
1690123
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