Title of article :
EELS study of Rh particle growth on ZrO2 substrate with different deposition conditions
Author/Authors :
Lykhach، نويسنده , , Y. and Sotiropoulou، نويسنده , , D. and Thiam، نويسنده , , M.M. and Pe?i?ka، نويسنده , , J. and Nehasil، نويسنده , , V.، نويسنده ,
Issue Information :
هفته نامه با شماره پیاپی سال 2001
Pages :
8
From page :
789
To page :
796
Abstract :
Electron energy loss spectroscopy (EELS) and Auger electron spectroscopy (AES) have been used to monitor the formation of Rh films on ZrO2(1 0 0) single crystalline substrates. Rhodium was evaporated step by step at various substrate temperatures. The surface morphology of the deposited material influences EELS spectra, so that the relative metal coverage of the substrate can be calculated. The EELS and AES results were compared and the conclusions concerning the deposit morphology were verified by means of transmission electron microscopy.
Keywords :
Clusters , Electron energy loss spectroscopy (EELS) , Auger electron spectroscopy , zirconium , GROWTH , Rhodium
Journal title :
Surface Science
Serial Year :
2001
Journal title :
Surface Science
Record number :
1690161
Link To Document :
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