Change of island density due to multi-channels of adatom diffusion

Recent experimental studies on surfactant-assisted thin film growth indicate that there is a strong possibility that adatoms can diffuse both on top of and under the surfactant layer. We present here a model of growth to study the effects of multi-channels of diffusion on the island density. We find that there can be four different regimes as temperature of growth increases from low to very high values. We find that there is a scaling relation of island density with deposition flux and temperature in each regime. The transition temperatures are found to be connected to the system parameters such as barriers to diffusion.