Title of article :
Adatom formation and atomic layer growth on Al(1 1 1) by ion bombardment: experiments and molecular dynamics simulations
Author/Authors :
Busse، نويسنده , , Carsten and Engin، نويسنده , , Cemal and Hansen، نويسنده , , Henri and Linke، نويسنده , , Udo and Michely، نويسنده , , Thomas and Urbassek، نويسنده , , Herbert M.، نويسنده ,
Issue Information :
هفته نامه با شماره پیاپی سال 2001
Abstract :
Rare gas ion bombardment of the Al(1 1 1) surface is found to produce adatoms with high efficiency, while at the same time stable vacancy clusters in the bulk are produced. As a result, scanning tunneling microscopy experiments show an initial bombardment-induced growth of several atomic layers instead of the expected erosion. This phenomenon is observed for Ne+, Ar+, and Xe+ for temperatures between 100 and 400 K and for ion energies between 0.3 and 8 keV. On the basis of molecular dynamics simulations insight into the atomic mechanism of bombardment-induced growth is gained. Ion bombardment causes local melting of the Al crystal near the surface. The energy is rapidly transported out of the molten volume, and after a few picoseconds a highly undercooled melt results, which has swollen above the initial surface layer. During recrystallization of the amorphous zone from the crystal inner towards the surface, vacancy clusters are left at the phase boundary, which stabilize part of the swollen material as adatoms, thus leading to the observed bombardment-induced growth.
Keywords :
morphology , Roughness , and topography , aluminum , Adatoms , Single crystal surfaces , Molecular dynamics , Scanning tunneling microscopy , Growth , Ion bombardment , surface structure
Journal title :
Surface Science
Journal title :
Surface Science