Title of article
Applications of infrared absorption spectroscopy to the microelectronics industry
Author/Authors
Chabal، نويسنده , , Y.J. and Raghavachari، نويسنده , , Krishnan، نويسنده ,
Issue Information
هفته نامه با شماره پیاپی سال 2002
Pages
10
From page
41
To page
50
Abstract
A review is presented of infrared absorption studies that are closely linked to the issues of silicon processing important for the microelectronics community. In particular, we focus attention on the contributions of infrared studies to wet chemical processing (HF etching) and silicon surface passivation (oxidation).
Keywords
Infrared absorption spectroscopy , Oxidation , Etching , Silicon
Journal title
Surface Science
Serial Year
2002
Journal title
Surface Science
Record number
1691790
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