Title of article :
Applications of infrared absorption spectroscopy to the microelectronics industry
Author/Authors :
Chabal، نويسنده , , Y.J. and Raghavachari، نويسنده , , Krishnan، نويسنده ,
Issue Information :
هفته نامه با شماره پیاپی سال 2002
Pages :
10
From page :
41
To page :
50
Abstract :
A review is presented of infrared absorption studies that are closely linked to the issues of silicon processing important for the microelectronics community. In particular, we focus attention on the contributions of infrared studies to wet chemical processing (HF etching) and silicon surface passivation (oxidation).
Keywords :
Infrared absorption spectroscopy , Oxidation , Etching , Silicon
Journal title :
Surface Science
Serial Year :
2002
Journal title :
Surface Science
Record number :
1691790
Link To Document :
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