Title of article :
Ab initio study of the adsorption and desorption of Se on the Si(0 0 1) surface
Author/Authors :
Cakmak، نويسنده , , M. and Srivastava، نويسنده , , G.P. and Ellialt?o?lu، نويسنده , , ?. and Colako?lu، نويسنده , , K.، نويسنده ,
Issue Information :
هفته نامه با شماره پیاپی سال 2002
Pages :
5
From page :
29
To page :
33
Abstract :
The adsorption and desorption of Se on the Si(0 0 1) surface are investigated, based upon the ab initio pseudopotential calculations. Following a recent experimental work, three different adsorption models have been studied: 1/2 ML of Se on the Si–Si dimer with a bridge position within the (1×2) surface reconstruction, 1 ML of Se sitting above the topmost Si atoms in bridge absorption site within the (1×1) surface reconstruction, and 2 ML of Se half of which is embedded into the Si bulk near the surface within the (1×1) surface reconstruction. For 1/2 ML, we have found that the vertical displacement between the Se atom and Si–Si dimer is 1.97 Å, close to the experimentally measured value of 2.10 Å. For 1 ML, the vertical displacement between the Se atom and the Si atoms is 1.41 Å, somewhat smaller than the experimentally measured value of 1.60 Å. For 2 ML, upon relaxation, the embedded Se atoms have diffused upwards. Our results are analysed to provide support to a recent experimental study of desorption of Se from the surface.
Keywords :
Low index single crystal surfaces , Density functional calculations , Silicon , Chalcogens
Journal title :
Surface Science
Serial Year :
2002
Journal title :
Surface Science
Record number :
1694166
Link To Document :
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