Title of article
Kinetics of tertiarybutylphosphine adsorption and phosphorus desorption from indium phosphide (0 0 1)
Author/Authors
Sun، نويسنده , , Y and Law، نويسنده , , D.C and Visbeck، نويسنده , , S.B and Hicks، نويسنده , , R.F، نويسنده ,
Issue Information
هفته نامه با شماره پیاپی سال 2002
Pages
7
From page
256
To page
262
Abstract
The kinetics of tertiarybutylphosphine adsorption and phosphorus desorption from indium phosphide (0 0 1) have been determined using reflectance difference spectroscopy for real-time monitoring of the phosphorus coverage. The precursor adsorption rate depends linearly on the coverage, and the initial sticking coefficient varies from 0.007 to 0.001 as the temperature increases from 420 to 520 °C. The phosphorus desorption rate is first order in the coverage and exhibits an activation energy and pre-exponential factor of 2.4 ± 0.2 eV and 1014.7 ± 1.5 s−1. These reaction kinetics play an important role in the growth of phosphide-based alloys by metalorganic vapor-phase epitaxy.
Keywords
Surface chemical reaction , Indium phosphide
Journal title
Surface Science
Serial Year
2002
Journal title
Surface Science
Record number
1694697
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