• Title of article

    Kinetics of tertiarybutylphosphine adsorption and phosphorus desorption from indium phosphide (0 0 1)

  • Author/Authors

    Sun، نويسنده , , Y and Law، نويسنده , , D.C and Visbeck، نويسنده , , S.B and Hicks، نويسنده , , R.F، نويسنده ,

  • Issue Information
    هفته نامه با شماره پیاپی سال 2002
  • Pages
    7
  • From page
    256
  • To page
    262
  • Abstract
    The kinetics of tertiarybutylphosphine adsorption and phosphorus desorption from indium phosphide (0 0 1) have been determined using reflectance difference spectroscopy for real-time monitoring of the phosphorus coverage. The precursor adsorption rate depends linearly on the coverage, and the initial sticking coefficient varies from 0.007 to 0.001 as the temperature increases from 420 to 520 °C. The phosphorus desorption rate is first order in the coverage and exhibits an activation energy and pre-exponential factor of 2.4 ± 0.2 eV and 1014.7 ± 1.5 s−1. These reaction kinetics play an important role in the growth of phosphide-based alloys by metalorganic vapor-phase epitaxy.
  • Keywords
    Surface chemical reaction , Indium phosphide
  • Journal title
    Surface Science
  • Serial Year
    2002
  • Journal title
    Surface Science
  • Record number

    1694697