• Title of article

    Surface properties of platinum thin films as a function of plasma treatment conditions

  • Author/Authors

    Li، نويسنده , , Zhiyong and Beck، نويسنده , , Patricia and Ohlberg، نويسنده , , Douglas A.A and Stewart، نويسنده , , Duncan B and Williams، نويسنده , , R.Stanley، نويسنده ,

  • Issue Information
    هفته نامه با شماره پیاپی سال 2003
  • Pages
    9
  • From page
    410
  • To page
    418
  • Abstract
    We examined the surface properties of platinum (Pt) thin films exposed to oxygen and argon plasma treatments and compared them to as-deposited Pt films. The surface wetting properties, refractive index and extinction coefficient of the Pt films were monitored as a function of time after different plasma treatments. Surfaces treated with an oxygen plasma were dramatically different from as-deposited Pt, whereas argon plasma treated surfaces were similar to as-deposited films. X-ray photoelectron spectroscopy confirmed the formation of platinum oxide on films treated with an oxygen plasma, while such oxide diminished after argon plasma treatment. Surface morphology studied with atomic force microscopy indicated a strong dependence of the surface roughness of the Pt films on the power and duration of the argon plasma used for the treatment. Based on these studies, an oxygen plasma treatment followed by a brief low-power argon plasma etch was developed for the purpose of regenerating clean and metallic Pt surfaces, and at the same time providing the smoothest possible surface morphology.
  • Keywords
    Plasma processing , X-ray photoelectron spectroscopy , morphology , and topography , Roughness , surface structure , Platinum , Metallic films , atomic force microscopy
  • Journal title
    Surface Science
  • Serial Year
    2003
  • Journal title
    Surface Science
  • Record number

    1695133