Title of article :
Kinetics of SiO vapor ammonolysis for nano-sized silicon nitride powder synthesis
Author/Authors :
Vongpayabal، نويسنده , , Panut and Kimura، نويسنده , , Shoichi، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2005
Pages :
10
From page :
73
To page :
82
Abstract :
The kinetics of SiO vapor ammonolysis to produce nano-sized silicon nitride powder was studied with an 80-mm-diameter vertical tubular flow reactor operated at temperatures ranging from 1300 °C to 1400 °C. The molar feed rate of NH3 was maintained 2–3 orders of magnitude in excess of stoichiometric ratio over SiO. The rate of reaction to form nano-sized powder was represented by a pseudo-first-order rate expression with respect to SiO concentration, independently of NH3 concentration. The temperature dependency of the pseudo-first-order rate constant was determined. The effects of mean residence time as well as the reaction temperature on the growth of nano-sized particles were investigated, and the minimum residence time to produce particles of critical size was estimated.
Keywords :
Silicon monoxide , Ammonolysis , Silicon nitride , high temperature , nano-sized powder
Journal title :
Powder Technology
Serial Year :
2005
Journal title :
Powder Technology
Record number :
1695331
Link To Document :
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