Title of article :
Ultrafast electron solvation dynamics in D2O/Cu(1 1 1): influence of coverage and structure
Author/Authors :
Gahl، نويسنده , , C. and Bovensiepen، نويسنده , , U. and Frischkorn، نويسنده , , Dietmar C. and Morgenstern، نويسنده , , K. H. Rieder، نويسنده , , K.-H. and Wolf، نويسنده , , M.، نويسنده ,
Issue Information :
هفته نامه با شماره پیاپی سال 2003
Pages :
5
From page :
108
To page :
112
Abstract :
Using femtosecond time-resolved two-photon photoelectron spectroscopy we have studied the dynamics of photoexcited electrons injected from a Cu(1 1 1) substrate into the conduction band of ultrathin ice layers. Ultrafast localization of the injected electrons within <50 fs is followed by a stabilization on a time scale of 0.1–1 ps due to local rearrangements of water dipoles. The dynamics of this electron solvation process are very similar for amorphous and crystalline ice, but exhibit a pronounced coverage dependence with two different regimes, which are attributed to solvation sites in the interior and at the surface of the adlayer. Additional information on the adsorbate structure is obtained from low-temperature scanning tunneling microscopy.
Keywords :
Surface electronic phenomena (work function , Surface potential , Surface states , etc.) , water , Copper , Visible and ultraviolet photoelectron spectroscopy , Scanning tunneling spectroscopies , Energy dissipation , Work function measurements
Journal title :
Surface Science
Serial Year :
2003
Journal title :
Surface Science
Record number :
1695617
Link To Document :
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