Title of article :
Difference between staying and diffusing Si adsorbates on the Si(1 1 1)7 × 7 surface
Author/Authors :
Uchida، نويسنده , , Hironaga and Watanabe، نويسنده , , Satoshi and Kuramochi، نويسنده , , Hiromi and Kishida، نويسنده , , Masaru and Kim، نويسنده , , Jooyoung and Nishimura، نويسنده , , Kazuhiro and Inoue، نويسنده , , Mitsuteru and Aono، نويسنده , , Masakazu، نويسنده ,
Issue Information :
هفته نامه با شماره پیاپی سال 2003
Pages :
9
From page :
737
To page :
745
Abstract :
We investigate adsorbed Si atoms on the Si(1 1 1)7 × 7 surface deposited from an scanning tunneling microscope (STM) tip. In our experiments at room temperature, two types of Si adsorbates on the surface are observed, “staying” Si adsorbate that remains at the same position, and “diffusing” Si one that is detected as a noise-like feature on an STM image. Molecular orbital calculations are performed to distinguish difference of these Si adsorbates. Stable positions, transition states, diffusion barriers and electron density iso-surfaces for extra Si atoms on Si cluster models are obtained. From these results, we propose new assignments to these Si adsorbates: the staying and diffusing Si adsorbates correspond to two Si atoms and a single Si atom, respectively.
Keywords :
surface diffusion , Scanning tunneling microscopy , Silicon , Chemisorption , Ab initio quantum chemical methods and calculations , Semi-empirical models and model calculations
Journal title :
Surface Science
Serial Year :
2003
Journal title :
Surface Science
Record number :
1695985
Link To Document :
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