Title of article :
Spontaneous transition from epitaxially constrained to equilibrium Ge nanocrystals on silicon-on-insulator (1 0 0)
Author/Authors :
Sutter، نويسنده , , E. and Sutter، نويسنده , , P. and Zahl، نويسنده , , P. and Rugheimer، نويسنده , , Paul P. and Lagally، نويسنده , , M.G.، نويسنده ,
Issue Information :
هفته نامه با شماره پیاپی سال 2003
Pages :
4
From page :
785
To page :
788
Abstract :
Epitaxial constraints define the stress-driven self-assembly of faceted nanocrystals and in particular one of their key characteristics––their shape. Here we identify a technologically relevant system, Ge islands grown on ultrathin silicon-on-insulator (SOI) substrate in which nanocrystals, whose shape is initially defined by epitaxial constraints, spontaneously overcome those constraints and transform to their equilibrium shape. Ge nanocrystals on ultrathin SOI form initially as huts and then transform into domes, similar to the sequence of epitaxially constrained shapes they assume on bulk Si(1 0 0). While the sequence on bulk Si ends here, we observe further dramatic morphological changes on ultrathin SOI: a spontaneous transformation to equilibrium-shaped Ge nanocrystals.
Keywords :
Electron microscopy , Silicon , Germanium , epitaxy , Faceting , SELF-ASSEMBLY
Journal title :
Surface Science
Serial Year :
2003
Journal title :
Surface Science
Record number :
1696016
Link To Document :
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