Title of article
Spontaneous transition from epitaxially constrained to equilibrium Ge nanocrystals on silicon-on-insulator (1 0 0)
Author/Authors
Sutter، نويسنده , , E. and Sutter، نويسنده , , P. and Zahl، نويسنده , , P. and Rugheimer، نويسنده , , Paul P. and Lagally، نويسنده , , M.G.، نويسنده ,
Issue Information
هفته نامه با شماره پیاپی سال 2003
Pages
4
From page
785
To page
788
Abstract
Epitaxial constraints define the stress-driven self-assembly of faceted nanocrystals and in particular one of their key characteristics––their shape. Here we identify a technologically relevant system, Ge islands grown on ultrathin silicon-on-insulator (SOI) substrate in which nanocrystals, whose shape is initially defined by epitaxial constraints, spontaneously overcome those constraints and transform to their equilibrium shape. Ge nanocrystals on ultrathin SOI form initially as huts and then transform into domes, similar to the sequence of epitaxially constrained shapes they assume on bulk Si(1 0 0). While the sequence on bulk Si ends here, we observe further dramatic morphological changes on ultrathin SOI: a spontaneous transformation to equilibrium-shaped Ge nanocrystals.
Keywords
Electron microscopy , Silicon , Germanium , epitaxy , Faceting , SELF-ASSEMBLY
Journal title
Surface Science
Serial Year
2003
Journal title
Surface Science
Record number
1696016
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