Title of article
In situ characterization of Mn and Fe silicide islands on silicon
Author/Authors
Tanaka، نويسنده , , Miyoko and Zhang، نويسنده , , Qi and Takeguchi، نويسنده , , Masaki and Furuya، نويسنده , , Kazuo، نويسنده ,
Issue Information
هفته نامه با شماره پیاپی سال 2003
Pages
6
From page
946
To page
951
Abstract
The Mn and Fe deposited clean Si(1 1 1) substrates were examined with UHV-TEM and STM that are part of an UHV-TEM/STM integrated characterization system. The Mn deposition with coverages of 5–20 ML followed by annealing at 673 K for 5 min formed MnSi islands. STM image revealed their surface √3×√3 structure. The re-deposition of 10–20 ML Mn and re-annealing at 573 K for 5 min succeeded to transform the MnSi islands into MnSi1.7. The Fe deposition with coverages of 5–20 ML followed by annealing at 873 K for 5 min formed β-FeSi2 islands. TEM image of these islands showed Moire fringes in different directions.
Keywords
Electron microscopy , Scanning tunneling microscopy , Iron , Manganese , Silicides , surface structure , Roughness , and topography , morphology
Journal title
Surface Science
Serial Year
2003
Journal title
Surface Science
Record number
1696123
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