Dissociative chemisorption of methylsilane and methylchloride on the Si(1 0 0) surface from first principles

The chemisorption process of methylsilane and methylchloride on the Si(1 0 0) surface is studied from first principles. Both the molecules are found to chemisorb dissociatively. The most stable adsorption structures are described. Moreover, the detailed adsorption processes are investigated by considering different possible reaction paths and evaluating the corresponding energy barriers that the molecules must overcome to dissociatively chemisorb on Si(1 0 0). Our results are compared with recent experimental observations.