Title of article :
UV-irradiation induced modification of PDMS films investigated by XPS and spectroscopic ellipsometry
Author/Authors :
Schnyder، نويسنده , , Bernhard and Lippert، نويسنده , , Thomas and Kِtz، نويسنده , , Rüdiger and Wokaun، نويسنده , , Alexander and Graubner، نويسنده , , Vera-Maria and Nuyken، نويسنده , , Oskar، نويسنده ,
Issue Information :
هفته نامه با شماره پیاپی سال 2003
Pages :
5
From page :
1067
To page :
1071
Abstract :
UV-irradiation (172 nm) induced changes of PDMS surfaces were investigated with X-ray photoelectron spectroscopy (XPS) and spectroscopic ellipsometry (SE). Both methods indicate the modification of the PDMS to a silica-like surface (SiO2). These conclusions could be drawn from the elemental composition determined by XPS and the binding energy shifts in the XPS spectra of the Si 2p and O 1s levels. Similarly the refractive index n determined with ellipsometry reaches a value close to the one of SiO2. Additionally, ellipsometry allows to monitor the decrease of the original film thickness with increasing UV-irradiation time.
Keywords :
ellipsometry , X-ray photoelectron spectroscopy , Amorphous surfaces , Insulating films , ozone , photochemistry , Coatings , Silicon oxides
Journal title :
Surface Science
Serial Year :
2003
Journal title :
Surface Science
Record number :
1696196
Link To Document :
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