Title of article :
Microstructural studies of TiN coatings prepared by PVD and IBAD
Author/Authors :
?kori?، نويسنده , , Branko and Kaka?، نويسنده , , Damir and Bibic، نويسنده , , Natasa and Rakita، نويسنده , , Milan، نويسنده ,
Issue Information :
هفته نامه با شماره پیاپی سال 2004
Abstract :
Titanium nitride (TiN) films have been deposited by physical vapour deposition (PVD), with BALZER equipment, and ion beam assisted deposition (IBAD) process, in DANFYSIK chamber. TiN thin films were grown, during IBAD process, by evaporation of Ti in presence of N2 and simultaneous bombarded with Ar+ ions. The evolution of the microstructure from porous and columnar grains to densel packed grains is accompanied by changes in mechanical and physical properties.
Keywords :
Coatings , and reflection , Scanning electron microscopy (SEM) , Adhesion , X-Ray scattering , Diffraction , Ion bombardment
Journal title :
Surface Science
Journal title :
Surface Science
