Title of article :
Crystal growth of SrTiO3 films on H-terminated Si(1 1 1) with SrO buffer layers
Author/Authors :
Machida، نويسنده , , Y. and Asaoka، نويسنده , , H. and Yamamoto، نويسنده , , H. and Shamoto، نويسنده , , S.، نويسنده ,
Issue Information :
هفته نامه با شماره پیاپی سال 2006
Pages :
5
From page :
724
To page :
728
Abstract :
Growth of epitaxial SrTiO3 (STO) films has been examined on H-terminated Si(1 1 1) with SrO buffer layers. The epitaxial SrO buffer layers have reduced stress on H-terminated Si substrates. On the SrO buffer layers, the STO films grow epitaxially with triple domains at low temperature. Each STO domain has equivalent epitaxial relationship to SrO buffer layers, STO(1 1 0)∥SrO(1 1 1) and STO [ 0 0 1 ] ∥ SrO [ 1 1 ¯ 0 ] .
Keywords :
Growth , epitaxy , Oxygen , Reflection high energy electron diffraction , Titanium , Molecular Beam Epitaxy , Silicon
Journal title :
Surface Science
Serial Year :
2006
Journal title :
Surface Science
Record number :
1697749
Link To Document :
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