Title of article :
Hydrogen dissociation on high-temperature tungsten
Author/Authors :
Zheng، نويسنده , , Wengang and Gallagher، نويسنده , , Alan، نويسنده ,
Issue Information :
هفته نامه با شماره پیاپی سال 2006
Pages :
7
From page :
2207
To page :
2213
Abstract :
H2 dissociation on polycrystalline tungsten is measured from 1700 to 3000 K using the filament temperature (T) change and a normalized H-atom density at the chamber surface. The dissociation probability per H2 filament collision (Pdiss) saturates at 0.40 at high T and has a 2.25 ± 0.05 eV apparent activation energy when Pdiss ≪ 1. This activation energy is consistent with prior data and models, but the H2 pressure dependence is not. Pdiss is independent of the H2 pressure for this entire T range and the 1–85 mTorr pressure range studied, contradicting the primary model that has been used to explain H2 dissociation on tungsten and other metals. We show that some apparently contradictory prior measurements are actually consistent with our observations and with each other, once this pressure dependence of Pdiss is recognized.
Keywords :
Polycrystalline surfaces , Tungsten , Hydrogen molecule , Dissociation , Desorption , Catalysis , Models of surface kinetics
Journal title :
Surface Science
Serial Year :
2006
Journal title :
Surface Science
Record number :
1698314
Link To Document :
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