Title of article :
Manipulating Ge quantum dots on ultrathin SixGe1−x oxide films using scanning tunneling microscope tips
Author/Authors :
Nakamura، نويسنده , , Yoshiaki and Takata، نويسنده , , Hiroyuki and Masada، نويسنده , , Akiko and Ichikawa، نويسنده , , Masakazu، نويسنده ,
Issue Information :
هفته نامه با شماره پیاپی سال 2006
Abstract :
Germanium quantum dots (QDs) were extracted from ultrathin SixGe1−x oxide films using scanning tunneling microscope (STM) tips. The extraction was most efficiently performed at a positive sample bias voltage of +5.0 V. The tunneling current dependence of the extraction efficiency was explained by the electric field evaporation transfer mechanism for positive Ge ions from QDs to STM tips. Ge QDs (∼7 nm) were formed and isolated spatially by extracting the surrounding Ge QDs with an ultrahigh density of >1012 cm−2. Scanning tunneling spectroscopy of the spatially-isolated QDs revealed that QDs with an ultrahigh density are electrically-isolated from the adjacent dots.
Keywords :
nanopatterning , Silicon , Germanium , Molecular Beam Epitaxy , Scanning Tunneling Microscope , Field evaporation , Scanning tunneling spectroscopy
Journal title :
Surface Science
Journal title :
Surface Science