Author/Authors :
Mulazzi، نويسنده , , Benito M. and Stanescu، نويسنده , , S. and Fujii، نويسنده , , J. and Vobornik، نويسنده , , I. and Boeglin، نويسنده , , C. and Belkhou، نويسنده , , R. and Rossi، نويسنده , , G. and Barbier، نويسنده , , A.، نويسنده ,
Abstract :
The growth and the crystalline and electronic structure of Ni deposited on single crystalline Cu(1 1 1) were studied by scanning tunnelling microscopy (STM), grazing incidence X-ray diffraction (GIXD) and angle–resolved photoemission spectroscopy (ARPES). In the early stages of growth monoatomic-high flat Ni islands, partially covered by Cu migrating from the surface, are observed. Starting from a pseudomorphic epitaxial relationship the in-plane lattice parameter progressively relaxes with increasing coverage. For a 20 monolayer (ML) thick deposit the in-plane lattice parameter is still found halfway between the bulk Ni and Cu lattice parameters. ARPES data also rule out the layer-by-layer growth and provide the values of the Ni exchange splitting.
Keywords :
Synchrotron radiation photoelectron spectroscopy , X-Ray scattering , Scanning tunnel microscopy , Metal–metal magnetic thin film structures , Diffraction and reflection