Title of article :
Investigation of the dissociative adsorption for cyclopropane on the copper surface by density functional theory and quantum chemical molecular dynamics method
Author/Authors :
Wang، نويسنده , , Xiaojing and Wang، نويسنده , , Yajun and Lv، نويسنده , , Chen and Kubo، نويسنده , , Momoji and Miyamoto، نويسنده , , Akira، نويسنده ,
Issue Information :
هفته نامه با شماره پیاپی سال 2007
Pages :
7
From page :
679
To page :
685
Abstract :
The dissociative adsorption of cyclopropane on the copper surface was studied using quantum chemical molecular dynamics method with “Colors-Excite” code and density functional theory by Amsterdam Density Functional program (ADF2000). The excited state of cyclopropane was used as adsorbate to simulate the dissociated adsorption under an irradiation energy of ca. 10 eV. One of the C–C bonds in cyclopropane was broken and the two new bonds between cyclopropane and copper surface were formed. The electrons transferred from the copper atoms to cyclopropane with a value of about 0.2e. The shorter distances between the carbons and surface copper atoms showed the existence of strong interaction. Consistently, the results indicated metallacyclopentane was the most possible intermediate species in dissociative adsorption by ADF2000 and “Colors-Excite” method.
Keywords :
Cyclopropane , Copper , Density functional theory , Quantum chemical molecular dynamics method , Dissociative adsorption
Journal title :
Surface Science
Serial Year :
2007
Journal title :
Surface Science
Record number :
1700194
Link To Document :
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